UVlithography相关论文
Contact exposure is an usual manner in conventional lithography,but it may exist in some shortages in the process of rea......
介绍了数字编码光栅尺的结构设计并提出一种制作方法.采用紫外对准光刻、全息光刻及湿法腐蚀结合在(100)硅片上制作母光栅尺, 并以......